oxidation temperature

The effects of thermal oxidation temperature and time on VO_x thin films under low temperature

低温热氧化处理温度与时间对氧化钒薄膜性能的影响最高[最低]温度计

The results show that the ultrasonic chemical plating thin film of the diamond surface is more even and compact, and ultrasonic can increase compressive strength, oxidation temperature of the diamond and the strength of the diamond after crystallization.

结果表明，超声波可使金刚石表面非晶态薄膜更加均匀和致密，从而提高了抗压强度，氧化温度和晶化后的强度。

When ferromagnetism of the diamond is relatively strong, its starting oxidation temperature decreases, twin peaks appear in the differential thermal curve and compressive strength of the diamond reduces as well.

当金刚石的铁磁性较强时，其起始氧化温度降低，差热分析出现双峰，且抗压强度也降低。

The tensile modulus showed a negligible change with thermal oxidation temperature.

模量随热氧化温度变化不明显。

It shows that oxidation temperature and time have great effects on the degree of ring formation for PHF.

发现多孔中空氧化纤维的环化程度随氧化温度升高和氧化时间延长而提高。

The thickness of the outmost layer and the Ni-rich layer increases with the increasing oxidation temperature.

随着氧化温度的提高，Ti-Ni合金薄膜氧化膜的最外层和富Ni层的厚度不断增加。